Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1992.11a
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- Pages.28-30
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- 1992
Nucleation and Growth Rate of CVD-W on TiN
TiN상에서의 CVD-W의 핵생상 및 성장속도
- Kim, Eui-Song (Dept. of Metallurgical Eng. Inha Univ.) ;
- Lee, Chong-Mu (Dept. of Metallurgical Eng. Inha Univ.) ;
- Lee, Jong-Gil (R&D Center, Samsung Electronics Co.)
- Published : 1992.11.07
Abstract
Long incubation period of W nucleation on the TiN glue layer is a serious problem in blanket W process. In this study we investigated the dependence of W nucleation and growth rate on the preparation method of the TiN film, deposition temperature, chemistry,
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