한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1994년도 제7회 학술발표회 및 한·일 CVD 심포지움 논문개요집
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- Pages.158.1-158
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- 1994
Vacuum SR Lithography with Using Plasma Polymerized Organo-silicon Resist
- Morita, Shinzo (Center of Co-operative Research on Advanced Science and Technology Nagoya University) ;
- Vinogradov, Georgy (Center of Co-operative Research on Advanced Science and Technology Nagoya University) ;
- Senda, Kenji (Center of Co-operative Research on Advanced Science and Technology Nagoya University) ;
- Shao, Chunlim (Center of Co-operative Research on Advanced Science and Technology Nagoya University)
- 발행 : 1994.06.01
초록
Totally dry lithography is studying with using plasma polymerized resist for almost 15 years. Recently organo-silicon ITlOnOmer was proposed as a new resist. When the plasma polymerized resist was irradiated through a mask in oxygen gas, the resist was oxidized and a fine pattern of submicron was successfully developed by
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