Spectroscopic Ellipsometer를 이용한 삼원 SiO박막의 유전율특성

The Dielectric Properties by Triple SiO Thin Film using Spectroscopic Ellipsometer

  • 김병인 (송원전문대학 전기과) ;
  • 이우선 (조선대학교 전기공학과) ;
  • 김창석 (조선대학교 전기공학과) ;
  • 이상일 (조선대학교 전기공학과) ;
  • 황석영 (단국대학교 전기공학과)
  • 발행 : 1994.11.18

초록

We fabricated the sample of M-I-M with the insulating layer SiO. Refractive index of wave length, photon energy, absorption rate of SiO evaporation thin film are experimentally examined by spectroscopic Ellipsometer. The calculated equations of refractive index, absorption rate and permittivity of SiO thin film are induced. Calculated values and experimental values are compared and then mutual validity is proved.

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