Enhancement of Response Speed in a-Ge:H Thin Film Semiconductor

수소화된 박막 비정질 Ge 반도체의 전기적 응답속도 향상 방안

  • 최규남 (시립인천전문대학 통신과)
  • Published : 1995.11.01

Abstract

The response speed enhancement in picosecond photoconductor made from RF planar magnetron sputtered hydrogenated amorphous germanium thin film is discussed. Pulsed laser annealing technique was used to fabricate the highly conductive ohmic contacts and to remove the shallow deflects in the deposited photoconductive film using the different laser powers. Measured V-I curve showed -5 times bigger conductance in photoconductive gap than the one used by the conventional vacuum annealing method using strip heater.

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