Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1995.05a
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- Pages.167-171
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- 1995
Crystallographic Orientation Dependence of Sputtering Rate in Sendust Targets
- Kim, Myong-Ryeong (LG Electronics Research Center) ;
- Hum Seo (LG Electronics Image and Media Lab.)
- Published : 1995.05.01
Abstract
The orientation dependence of sputtering rate in the sendust polysrystalline targets was studied, It was fount from the present work that the erosion process is not uniform from one grain to another even within a target because of its polysrystalline nature showing many different orientation of grains. The grains oriented to promote efficient erosion were characterized by the close-packed planes which have large interplanar spacing and strong binding energy, The characteristic line patterns appeared on as-sputter target surface are discussed in terms of symmetry of crystllographic planes.
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