Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1996.05a
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- Pages.288-291
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- 1996
A Study on the Etching Properties of TiW Films
TiW막의 식각특성 연구
Abstract
The surface properties after plasma etching of TiW solutions using the chemistries of BCl
Keywords