Hydrogen Detection Characteristics of the MIS Structure Using the LPCVD Silicon Nitride

LPCVD 질화막을 이용한 MIS 소자의 수소가스 검지 특성

  • Published : 1997.07.21

Abstract

This paper reports the characteristic of tile MIS structure composed of the LPCVD nitride on the oxide for the hydrogen gas detection. Pt was used as catalytic metal for detecting the hydrogen gas and the flat band voltage shift was measured at various hydrogen concentration. We found the flat band voltage shift was proportional to the hydrogen concentration.

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