Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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A study on the deposition of DLC thin films by using an FCVA technique

FCVA 방법에 의한 DLC 박막의 제작에 관한 연구

  • Lee, Hae-Seung (Thin Films & Display Lab., Dept. of Electrical Engineering, Hanyang University) ;
  • Uhm, Hyun-Seok (Thin Films & Display Lab., Dept. of Electrical Engineering, Hanyang University) ;
  • Kim, Jong-Kuk (Samsung Electronics Co., Production Engineering Center, Corporate Technical Operations) ;
  • Choi, Byoung-Ryong (Samsung Electronics Co., Production Engineering Center, Corporate Technical Operations) ;
  • Park, Jin-Seok (Thin Films & Display Lab., Dept. of Electrical Engineering, Hanyang University)
  • 이해승 (한양대학교 전기공학과, 박막 및 디스플레이 연구실) ;
  • 엄현석 (한양대학교 전기공학과, 박막 및 디스플레이 연구실) ;
  • 김종국 (삼성전자(주) 기술총괄 생산기술센터) ;
  • 최병룡 (삼성전자(주) 기술총괄 생산기술센터) ;
  • 박진석 (한양대학교 전기공학과, 박막 및 디스플레이 연구실)
  • Published : 1997.07.21
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Abstract

Diamond-like carbon(DLC) thin films are produced by using a filtered cathodic vacuum arc(FCVA) deposition system. Different magnetic components, namely steering, focusing, and filtering plasma-optic systems, are used to achieve a stable arc plasma and to prevent the macroparticles from incorporating into the deposited films. Effects of magnetic fields on plasma behavior and film deposition are examined. The carbon ion energy is found to be varied by applying a negative (accelerating) substrate bias voltage. The deposition rate of DLC films is dependent upon magnetic field as well as substrate bias voltage and at a nominal deposition condition is about $2{\AA}/s$. The structural properties of DLC films, such as internal stress, relative fraction of tetrahedral($sp^3$) bonds, and surface roughness have also been characterized as a function of substrate bias voltages and partial gas($N_2$) pressures.

Keywords