Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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A study on the fabrication and characteristics of plasma Polymerized hexamethyldisiloxane thin films

플라즈마중합 헥사메틸디실록산 박막의 제조 및 특성에 관한 연구

  • Lee, S.H. (Dept. of Electrical Eng., Inha University) ;
  • Lee, B.S. (Dept. of Electrical Eng., Inha University) ;
  • Park, S.H. (Dept. of Electrical Eng., Kyungnam University) ;
  • Lee, N.H. (Dept, of Electronic Eng., Kyoungwon University) ;
  • Kim, J.S. (Dept, of Electrical Eng. Taejon Nat'l University of Technology) ;
  • Woo, H.W. (Dept. of Electrical Eng., Inha Technical Junior College) ;
  • Lee, D.C. (Dept. of Electrical Eng., Inha University)
  • 이상희 (인하대학교 전기공학과) ;
  • 이병수 (인하대학교 전기공학과) ;
  • 박상현 (경남대학교 전기공학과) ;
  • 이능헌 (경원대학교 전자공학과) ;
  • 김종석 (대전산업대학교 전기공학과) ;
  • 우호환 (인하공업전문대학 전기과) ;
  • 이덕출 (인하대학교 전기공학과)
  • Published : 1997.07.21
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Abstract

Plasma polymerized thin films were fabricated by interelectrode capacitively coupled type apparatus. FT-IR analyses indicated that the thin film spectra are composed not only of the corresponding monomer bands but also of several new bands. Relative dielectric constant and dielectric loss tangent of thin films fabricated in the discharge power of 90[W] showed $3.212{\sim}3.805$ and $0.0026{\sim}0.0451$ in alternating frequency of $10^3{\sim}10^6$[Hz]. Contact angle measurement indicated that cross-link of the films is increased with the discharge power.

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