In Situ Dry Etching pprocesses for Moly Multi-Layers with application to the Reduced Process-Less Mask TFT

  • Hong, Hong-Munppyo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Kim, Kim-Sanggab (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Yu, Yu-Chungi (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Cho, Cho-Seongyun (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Kim, Kim-Jangsoo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Kim, Kim-Chiwoo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Yang, Yang-Honggun (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
  • Souk, Joon-Yung (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900)
  • Published : 1997.02.01