Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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A Cu-Ni Thin Film Pressure Sensor

Cu-Ni 박막 압력 센서

  • 민남기 (고려대학교 제어계측공학과) ;
  • 전재형 (고려대학교 제어계측공학과) ;
  • 이성래 (고려대학교 재료금속공학부) ;
  • 김정완 ((주)대 성 전 기)
  • Published : 1997.11.01
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Abstract

The fabrication and performance of a thin film pressure sensor are described. Cu-Ni thin film strain gauges have been fabricated by RF magnetron sputtering. For all the gauges, the relative chance in resistance ΔR/R with pressure is of the order 10$^{-3}$ for the maximum pressure. The output characteristic is found to be linear over the entire Pressure range (0-30kgf/cm$^2$) and the output sensitivity is 1.6 mV/V. The maximum nonlinearity observed in output characteristics is 0.34%FS for 5V excitation and the hysteresis is less than 0.1%FS.

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