Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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A study on A1$_2$O$_3$ coating by Electrophoretic Method

전기영동법을 이용한 A1$_2$O$_3$코팅에 관한 연구

  • 주상현 (명지대학교 전자공학과) ;
  • 소대화 (명지대학교 전자공학과) ;
  • 전용우 (성덕전문대학교 전자과)
  • Published : 1997.11.01
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Abstract

In this experiment, A1$_2$O$_3$ thick films were prepared by electrophoretic method using A1$_2$O$_3$ fine Powder of which composition were FA-5-500 and FA-5-900. The growth behavior of A1$_2$O$_3$ thick films were characterized as preparation conditions, such as applied voltage, deposition time and adding conditions. As a result, A1$_2$O$_3$ thick films were successfully fabricated by electrophoretic method on molybdnum plate in which etanol and distilled used were used as a solvent. Deposition conditions for good uniformity of the A1$_2$O$_3$ thick films were applied voltage of 60volts, deposition time of 2 seconds, heat treatment at 1$700^{\circ}C$ for 5 minutes.

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