Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1997.11a
- /
- Pages.484-488
- /
- 1997
Epitaxial Growth of BSCCO Thin Films Fabricated by Son Beam Sputtering
- Park, Yong-Pil (Dept. of Electrical & Electronic Eng. Dongshin Univ.) ;
- Lee, Joon-Ung (Dept. of Electrical Eng., Kwangwoon Univ.)
- Published : 1997.11.01
Abstract
BSCCO thin film is fabricated cia both processes of co-deposition and layer-by-layer deposition at an ultralow growth rate using ion beam sputtering method. The adsorption of Bi atom and the appearance of Bi-2212 phase shows large differance between both processes. It is found that the resident time of Bi vapor species on the surface of the substrate strongly dominates the film composition and the formation of the structure.
Keywords