축방향 자기장의 주기적 단속을 이용한 유도결합형 플라즈마 식각장비의 고품위 플라즈마 형성

The generation of Uniform High Density Plasma of Inductively Coupled Plasma Etcher Enhanced by Alternating Axial Magnetic Field

The performance of inductively coupled plasma (ICP) is enhanced by axial magnetic field driven by alternating current Helmholtz coils in this work. Langmuir pobe is used to characterize the plasma, and the etching performance is demonstrated with phororesist stripping process. It is shown that its density and uniformity depends on the frequency of driving current to the magnetic field.