Electron Tunneling Characteristics of PtSi-nSi Junctions according to Temperature Variations

온도변화에 따른 백금 실리사이드-엔 실리콘 접합의 전자 터널링 특성

  • 장창덕 (동의대학교 전자공학과) ;
  • 이정석 (동의대학교 전자공학과) ;
  • 이광우 (구미기능대학 전자기술학과) ;
  • 이용재 (동의대학교 전자공학과)
  • Published : 1998.06.01

Abstract

In this paper, We analyzed the current-voltage characteristics with n-type silicon substrates concentration and temperature variations (Room temperature, 50$^{\circ}C$, 75$^{\circ}C$) in platinum silicide and silicon junction. The electrical parameters of measurement are turn-on voltage, saturation current, ideality factor, barrier height, dynamic resistance in forward bias and reverse breakdown voltage according to variations of junction concentration of substrates and measurement temperature variations. As a result, the forward turn-on voltage, reverse breakdown voltage, barrier height and dynamic resistance were decreased but saturation currents and ideality factor were increased by substrates increased concentration variations in platinum silicide and n-silicon junction. In increased measurement temperature (RT, 50$^{\circ}C$, 75$^{\circ}C$), the extracted electrical parameter values of characteristics were rises by increased temperature variations according to the forward and reverse bias.

Keywords