LOW PERMITTIVITY FERROELECTRIC THIN FILMS FOR FERROELECTAIC GATE FIELD EFFECT TRANSISTOR BY CHEMICAL SOLUTION DEPOSITION

  • Jang, S.W. (College of Eng., Yeungnam University) ;
  • Kim, C.Y. (College of Eng., Yeungnam University) ;
  • Woo, D.C. (College of Eng., Yeungnam University) ;
  • Lee, H.Y. (College of Eng., Yeungnam University) ;
  • Jung, W.S. (College of Eng., Yeungnam University) ;
  • Lee, W.J. (ETRI, Daejon) ;
  • Kim, S.H. (Dept. of Mat Sci. & Eng. North Carolina State University)
  • Published : 1998.08.01