Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.08a
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- Pages.78.2-78
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- 1998
THE CHARACTERIZATION OF SHALLOW TRENCH ISOLATION CHEMICAL MECHANICAL PLANARIZATION(STI CMP) THROUGH THE ANALYSIS FOR RELATIONSHIP OF BETWEEN PATTERN AND NON-PATTERN WAFER
- Kim, Yong-Sik (FAB Division, ANAM Semiconductor) ;
- Lee, Yang-Won (FAB Division, ANAM Semiconductor) ;
- Kim, Dae-Young (FAB Division, ANAM Semiconductor) ;
- Kim, Sang-Yong (FAB Division, ANAM Semiconductor) ;
- Choi, Jae-Sung (FAB Division, ANAM Semiconductor)
- Published : 1998.08.01
Abstract
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