FABRICATION OF GAN MESFET USING THE PHOTOELECTROCHEMICAL ETCHING PROCESS

  • Lee, W.S. (Device & Materials Lab, AD Group. LG CIT) ;
  • Choi, Y.H. (Device & Materials Lab, AD Group. LG CIT) ;
  • Jung, K.W. (Device & Materials Lab, AD Group. LG CIT) ;
  • Shin, M.W. (Dept. of Inorganic Materials Eng., Myongji Univ.) ;
  • Moon, D.C. (Dept. of Electronic Mater. Eng., Kwangwoon Univ.)
  • Published : 1998.08.01