SURFACE AND INTERFACIAL BEHAVIOR DURING THE CRYSTALLIZATION OF a-Si:H FILMS DEPOSITED BY DC-SADDLE FIELD CVD; AN IN-SITU SYNCHROTRON X-RAY SCATTERING STUDY

Kim, H.J. (Department of Materials Science and Engineering. and Center for Electronic Materials Research, Kwangju Institute of Science and Technology) ;
Jeon, S.H. (Department of Materials Science and Engineering. and Center for Electronic Materials Research, Kwangju Institute of Science and Technology) ;
Noh, D.Y. (Department of Materials Science and Engineering. and Center for Electronic Materials Research, Kwangju Institute of Science and Technology)