Modeling of Inductively Couppled High Density pplasma pprocesses for the Fabrication of Semiconductor Devices

Shin, Jai-Kwang (Suppercompputing Application Laboratory Samsung Advanced Institute of Technology) ;
Oh, Jae-Joon (Suppercompputing Application Laboratory Samsung Advanced Institute of Technology) ;
Kim, Seong-Gu (Suppercompputing Application Laboratory Samsung Advanced Institute of Technology) ;
Huh, Jae-Seok (Suppercompputing Application Laboratory Samsung Advanced Institute of Technology) ;
Lee, Hyoung-In (Suppercompputing Application Laboratory Samsung Advanced Institute of Technology) ;
Kim, Dong-Gyu (Etch ppJT, pprocess Technology Team, Semiconductor Business Division Samsung Electronics Comppany) ;
Mark J. Kushner (Deppartment of Electrical and Compputer Engineering University of Illinois, Urbana-Champpaign)