The study of UV emission in ZnO thin films fabricated by Pulsed Laser Deposition

레이저 증착법에 의해 제작된 ZnO 박막의 UV 발광특성연구

  • 배상혁 (연세대학교 전기공학과) ;
  • 이상렬 (연세대학교 전기공학과) ;
  • 진범준 (연세대학교 금속공학과) ;
  • 우현수 (연세대학교 금속공학과) ;
  • 임성일 (연세대학교 물리학과)
  • Published : 1999.11.01

Abstract

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355 nm. In order to investigate the effect of the deposition conditions on the properties of ZnO thin films at an oxygen pressure of 350 mTorr, the experiment has been Performed at various substrate temperatures in the range of 20$0^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained and the intensity of UV emission was the highest at 40$0^{\circ}C$ substrate temperature.

Keywords