Crystal Structure Ana1ysis of the Diamond Films Grown by MPCVD

MPCVD에 의한 다이아몬드 박막의 결정구조 해석

  • 원종각 (경원대학교 화학공학과) ;
  • 김종성 (경원대학교 화학공학과) ;
  • 흥근조 (경원대학교 전기전자공학과) ;
  • 권상직 (경원대학교 전기전자공학과)
  • Published : 1999.11.01

Abstract

The diamond thin films are deposited on silicon using MPCVD(Microwave Plasma Chemical Vapor Deposition) method at various deposition microwave power and time. Diamond is deposited with 100 sccm H$_2$ and 2 sccm CH$_4$ by MPCVD. The crystallinity of diamond thin films were increased with increase of microwave power. The growth rate of diamond thin films were increased with increase of time.

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