Influence of Channel Length on the Performance of Poly-Si Thin-Film Transistors

다결정 실리콘 박막 트랜지스터의 성능에 대한 채널 길이의 영향

  • 이정석 (동의대학교 전자공학과) ;
  • 장창덕 (동의대학교 전자공학과) ;
  • 백도현 (동의대학교 전자공학과) ;
  • 이용재 (동의대학교 전자공학과)
  • Published : 1999.05.01

Abstract

In this paper, The relationship between device performance and channel length(1.5-50$\mu$m) in polysilicon thin-film transistors fabricated by SPC technology was Investigated by measuring electric Properties such as 1-V characteristics, field effect mobility, threshold voltage, subthreshold swing, and trap density in grain boundary with channel length. The drain current at ON-state increases with decreasing channel length due to increase of the drain field, while OFF-state current (leakage current) is independent of channel length. The field effect mobility decrease with channel length due to decreasing carrier life time by the avalanche injection of the carrier at high drain field. The threshold voltage and subthreshold swing decrease with channel length, and then increase in 1.5 $\mu$m increase of increase of trap density in grain boundary by impact ionization.

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