Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1999.05a
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- Pages.575-577
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- 1999
E-beam Lithography using Plasma Processes
플라즈마 공정을 이용한 전자빔 리소그래피
- Kim, Sung-O (Dept.of Electrical Eng., Inha University) ;
- Lee, Jin (Dept.of Electrical Eng.,Mok-po National University) ;
- Lee, Kyung-Sup (Dept.of Electrical Eng., Dongshin University) ;
- Lee, Duck-Chool (Dept.of Electrical Eng., Inha University)
- Published : 1999.05.01
Abstract
In this study, the PPPI(Plasma Polymerized Phenyl Isothiocyanate) resist thin film was manufactured in accordance with the plasma polymerization method and after exposing it to an electron beam, a pattern was formed by plasma etching. With the FT-IR(Fourier transform-infrared spectrometry) analysis, it was confirmed that the PI(Phenl Isothiocyanate) monomer was successsfully produced into a thin film by the plasma. The polymerization rate of the thin film was 450~ 1012(
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