기판온도에 변화에 따른 ZnO 박막의 UV 발광특성 연구

UV emission characterization of ZnO films depending on the variation of substrata temperature

  • 배상혁 (연세대학교 전기컴퓨터공학과) ;
  • 이상렬 (연세대학교 전기컴퓨터공학과)
  • Bae, Sang-Hyuck (Department of Electrical and Computer Engineering, Yonsei University) ;
  • Lee, Sang-Yeol (Department of Electrical and Computer Engineering, Yonsei University)
  • 발행 : 1999.11.20

초록

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition using a Nd:YAG laser with the wavelength of 355 nm at an oxygen pressure of 350 mTorr. In order to investigate the effect of the substrate temperature on the properties of ZnO thin films, the experiment has been performed at various substrate temperatures in the range of $200^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained by pulsed laser deposition technique. However, the intensity of UV emission is mostly depending on the stoichiometry of ZnO films.

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