대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2000년도 하계학술대회 논문집 C
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- Pages.2224-2226
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- 2000
MEMS 소자를 위한 무전해 니켈도금의 잔류응력과 인 농도 의존성
Residual Stresses and Phosphorous Concentration Dependence upon Electroless Nickel Process Conditions for MEMS
- Yi, Seung-Hwan (University of Hawaii) ;
-
Min, Nam-Ki
(Korea University)
;
- Ko, Ju-Yeol (Korea University) ;
- Kim, Eun-Sok (University of Southern California)
- 발행 : 2000.07.17
초록
In this paper, we tried to figure out the residual stress of Electroless Nickel (EN) films as a function of process conditions: bath temperatures, pH values, and hypophosphorous acid concentrations. The residual stresses of EN films were in the range of - 4 MPa to 250 MPa depending on process conditions and they were very sensitive to phosphorous concentration in EN film and also hypophosphorous acid concentrations in EN bath.
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