Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Crystal orientation of $Ni_{81}Fe_{19}$ thin film prepared by facing targets sputtering method

대향타겟식 스퍼터법으로 제작한 $Ni_{81}Fe_{19}$박막의 결정배향성

  • 김용진 (경원대학교 공대 전기전자공학부) ;
  • 박창옥 (카톨릭상지대학 전기전자계열) ;
  • 최동진 (경원대학교 공대 전기전자공학부) ;
  • 김경환 (경원대학교 공대 전기전자공학부)
  • Published : 2000.07.01
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Abstract

Crystal orientation of Ni$_{18}$ $Fe_{19}$ thin films prepared by facing targets sputtering system was investigated. FTS system can deposit a high quality thin film and control deposition conditions in wide range. T he crystallographic characteristics of Ni$_{18}$ $Fe_{19}$ thin films on variation of thickness and substrate tempera ture was investigated by XRD and AFM. As a result, we obtained Ni$_{18}$ $Fe_{19}$ thin films prepared at subst rate temperature room temperature, thickness 160nm and over revealed good crystal orientation to [111] direction.irection.

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