Surface Morphology and Magnetic Properties of NiFe Thin Films

NiFe 박막의 표면형상과 자기특성

  • 이원재 (한국전기연구소 박형 전기소자 T.F.T) ;
  • 백성관 (한국전기연구소 박형 전기소자 T.F.T) ;
  • 민복기 (한국전기연구소 박형 전기소자 T.F.T) ;
  • 송재성 (한국전기연구소 박형 전기소자 T.F.T) ;
  • 김현식 (한국전기연구소 박형 전기소자 T.F.T) ;
  • 이동윤 (한국전기연구소 박형 전기소자 T.F.T)
  • Published : 2000.07.01

Abstract

The correlation of surface morphology and magnetic property of NiFe thin films on Si(001) deposited by RF-magnetron sputter has been investigated, using AFM, XRD and MR measurements. During short field annealing for 15 min, there was no significant change in XRD patterns of NiFe thin films. However, the degree of surface roughness was changed with increasing annealing temperature. With variation of surface roughness, there was significant difference in MR characteristics of NiFe thin films. In the case of as-deposited NiFe thin films(T$\_$G/ = 150$^{\circ}C$) and UFA400 (T$\_$A/ = 400$^{\circ}C$) having smooth surface, good linearity of MR Curve was observed.

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