Tunneling Magnetoresistance: Physics and Applications for Magnetic Random Access Memory

  • Park, Stuart in (IBM Almaden Research Center, California) ;
  • M. Samant (IBM Almaden Research Center, California) ;
  • D. Monsma (IBM Almaden Research Center, California) ;
  • L. Thomas (IBM Almaden Research Center, California) ;
  • P. Rice (IBM Almaden Research Center, California) ;
  • R. Scheuerlein (IBM Almaden Research Center, California) ;
  • D. Abraham (IBM T.J. Watson Research Center) ;
  • S. Brown (IBM T.J. Watson Research Center) ;
  • J. Bucchigano (IBM T.J. Watson Research Center)
  • Published : 2000.09.01

Abstract

MRAM, High performance MRAM using MTJS demostrated, fully integrated MTJ MRAM with CMOS circuits, write time ~2.3 nsec; read time ~3 nsec, Thermally stable up to ~350 C, Switching field distibution controlled by size & shape. Magnetic Tunnel Junction Properties, Magnetoresistance: ~50% at room temperature, enhanced by thermal treatment, Negative and Positive MR by interface modification, Spin Polarization: >55% at 0.25K, Insensitive ot FM composition, Resistance $\times$ Area product, ranging from ~20 to 10$^{9}$ $\Omega$(${\mu}{\textrm}{m}$)$^{2}$, Spin valve transistor, Tunnel injected spin polarization for "hot" electrons, Decrease of MTJMR at high bias originates from anode.

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