Compound Source MBE를 이용한 InGaP/InGaAs p-HEMT 구조의 성장 및 특성 분석

Growth and Characterization of InGaP/InGaAs p-HEMI Using Compound Source MBE

  • Kim, J.H. (Dept. of Information and Communications Kwang-Ju Institute of Science and Technology) ;
  • S.J. Kang (Dept. of Information and Communications Kwang-Ju Institute of Science and Technology) ;
  • S.J. Jo (Dept. of Information and Communications Kwang-Ju Institute of Science and Technology) ;
  • J.D. Song (Dept. of Information and Communications Kwang-Ju Institute of Science and Technology) ;
  • Lee, Y.T. (Dept. of Information and Communications Kwang-Ju Institute of Science and Technology) ;
  • J.I. Song (Dept. of Information and Communications Kwang-Ju Institute of Science and Technology)
  • Published : 2000.06.01

Abstract

DC and low frequency noise characteristics of InGaP/InGaAs pseudomorphic HEMTs (p-HEMTs) grown by compound source MBE are investigated for temperature range of 150K to 370K. Equivalent input noise spectra( $S_{iv}$ ) were measured as a function of frequency and temperature. $S_{iv}$ was measured to be 3.4 $\times$ 10$^{-12}$ $V^2$/ Hz at 1kHz for 1.3 X 50${\mu}{\textrm}{m}$$^2$InGaP/InGaAs p-HEMT at room temperature. Measurements of the low-frequency noise spectra of the p-HEMT as a function of temperature show that the trap with an activation energy level around 0.589 eV is a dominant trap that accounts for the low-frequency noise behavior of the device. The normalized extrinsic gm frequency dispersion of the p-HEMT. was as low as 2.5% at room temperature, indicating that the device has well-behaved low-frequency noise characteristics. Sub-micron (0.25 $\times$ 50${\mu}{\textrm}{m}$$^2$) gate p-HEMT showed $f_{T}$ and $f_{max}$ of 40GHz and 108GHz, respectively.y.y.

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