대한전자공학회:학술대회논문집 (Proceedings of the IEEK Conference)
- 대한전자공학회 2000년도 추계종합학술대회 논문집(4)
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- Pages.223-226
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- 2000
주변 마스크와 일반화 대칭변환 알고리듬을 이용한 인쇄물 검사 시스템
A Visual Inspection System for Printing Detects using Perimetric Mask and Generalized Symmetry Transform Algorithm
초록
In this paper, we report detects system algorithm, adapted a perimetric mask and a generalized symmetry system, to detect a transformable material and find out a minute error cannot be noticed by a naked eye. In this thesis, supposed a stable detecting system applied a general image processing theory and perimetric mash algorithm to detect badness. And finally, detected some vague errors with the application of symmetry transform algorithm that accumulate a symmetry of minute error and put stress on it.
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