Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Phase Stability of Bi2212 and Bi2223 Thin Films Fabricated by ion Beam Sputtering

  • Lee, Hee-Kab (Department of Electrical ＆ Electronic Eng., Dongshin University) ;
  • Park, Yong-Pil (Department of Electrical ＆ Electronic Eng., Dongshin University) ;
  • Kim, Jeong-Ho (Department of Mechatronics Eng., Changwon National University)
  • Published : 2000.11.01
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Abstract

Bi2212 and Bi2223 thin films are fabricated by ion beam sputtering method. Three phases of Bi2201, Bi2212 and Bi2223 appear as stable ones in spite of the condition for thin film fabrication of Bi2212 and bi2223 compositions, depending on substrate temperature(T$\sub$sub/) and ozone pressure (PO$_3$). It is found out that these phases show similar T$\sub$sub/ and PO$_3$ dependence, and that the stable regions of these phases are limited within very narrow temperature.

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