한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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- Pages.101-102
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- 2000
Effect of Bias Voltage on the Micro Discharge Characteristics of MgO Film prepared by Unbalanced Magnetron Sputtering
- Kim, Young-Kee (Dept. of Electrical Eng. Pusan National University) ;
- Park, Jung-Tea (Dept. of Electrical Eng. Pusan National University) ;
- Park, Cha-Soo (Dept. of Electrical Eng. Pusan National University) ;
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Cho, Jung-Soo
(Dept. of Electrical Eng. Pusan National University)
;
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Park, Chung-Hoo
(Dept. of Electrical Eng. Pusan National University)
- 발행 : 2000.01.13
초록
The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the de bias voltage of -10V showed lower discharge voltage, lower erosion rate by ion bombardment, higher optic transparency and higher crack resistance in annealing process than those samples prepared by conventional magnetron sputtering or E-beam evaporation.
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