한국정보디스플레이학회:학술대회논문집

한국정보디스플레이학회 (The Korean Infomation Display Society)
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MgO Sputtering in the AC-PDPs with Monte Carlo Methods

  • Gill, Doh-Hyun (Charged Particle Beam and Plasma Laboratory, Department of Electrophysics /PDP Research Center, Kwangwoon University) ;
  • Kim, Hyun-Sook (Charged Particle Beam and Plasma Laboratory, Department of Electrophysics /PDP Research Center, Kwangwoon University) ;
  • Joh, Dae-Guen (Charged Particle Beam and Plasma Laboratory, Department of Electrophysics /PDP Research Center, Kwangwoon University) ;
  • Kim, Young-Guon (Charged Particle Beam and Plasma Laboratory, Department of Electrophysics /PDP Research Center, Kwangwoon University) ;
  • Choi, Eun-Ha (Charged Particle Beam and Plasma Laboratory, Department of Electrophysics /PDP Research Center, Kwangwoon University) ;
  • Cho, Guang-Sup (Charged Particle Beam and Plasma Laboratory, Department of Electrophysics /PDP Research Center, Kwangwoon University)
  • 발행 : 2000.01.13
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초록

Sputtering yield of MgO film in the AC-PDPs has been calculated by Monte Carlo simulation of ion scattering. In the ion energy range less than 50 eV, the sputtering yield is 4 ${\times}$ $10^{-4}$ for Xe ions and it is between 0.1 and 0.01 for He, Ne, and Ar ions. The erosion rate is estimated about $25{\AA}$ per hour for Xe ions in an actual PDP plasma for sustain and full white mode.

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