한국정보디스플레이학회:학술대회논문집

한국정보디스플레이학회 (The Korean Infomation Display Society)
권호 표지

In-situ Fluorine Passivation by Excimer Laser Annealing

  • Jung, Sang-Hoon (School of Electrical Engineering, Seoul National University) ;
  • Kim, Cheon-Hong (School of Electrical Engineering, Seoul National University) ;
  • Jeon, Jae-Hong (School of Electrical Engineering, Seoul National University) ;
  • Yoo, Juhn-Suk (School of Electrical Engineering, Seoul National University) ;
  • Han, Min-Koo (School of Electrical Engineering, Seoul National University)
  • 발행 : 2000.01.13
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

We propose a new in-situ fluorine passivation of poly-Si TFTs by excimer laser annealing to reduce the trap density and improve the reliability significantly. This improvement is due to the formation of stronger Si-F bonds than Si-H bonds which passivate the trap states.

키워드