Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.11a
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- Pages.145-148
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- 2001
Improvement of 170 etching uniformity in a large area plasma source
대면적 플라즈마 소스에서의 ITO 식각균일도 향상
Abstract
A large area plasma source using parallel 2x2 ICP antennas showed improved etching uniformity by the E-ICP operation. ITO etching process with CH