한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2001년도 창립10주년 제20회 학술발표회
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- Pages.148-148
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- 2001
Growth of epitaxial Al2O3 films on silicon by ionized beam deposition
- Choi, Y.K. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
- Whangbo, S.W. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
- Chung, K.B. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
- Jang, H.K. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
- Whang, C.N. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University)
- 발행 : 2001.02.22