Growth of epitaxial Al2O3 films on silicon by ionized beam deposition

  • Choi, Y.K. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
  • Whangbo, S.W. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
  • Chung, K.B. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
  • Jang, H.K. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University) ;
  • Whang, C.N. (Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei University)
  • 발행 : 2001.02.22