한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

수직자기기록용 박막의 제작에 있어서 아몰퍼스 실리콘 하지층이 결정학적 특성에 미치는 영향

The Effected of Amorphous Si Underlayer to Crystallographic Characteristics for Prepared Perpendicular Magnetic Recording Media Thin Film

  • 박원효 (경원대학교 정보통신공학과) ;
  • 김용진 (경원대학교 정보통신공학과) ;
  • 손인환 (신성대학교 전기과) ;
  • 가출현 (신성대학교 전기과) ;
  • 박창옥 (카톨릭 상지대학교 전기설비과) ;
  • 김경환 (경원대학교 정보통신공학과)
  • 발행 : 2002.07.01
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초록

In order to increase perpendicular magnetic anisotropy of magnetic layer and prepare magnetic recording layer with a good quality by epitaxial growth between magnetic layer and, we prepared Co$\_$77/Cr$\_$20/Ta$_3$/Si doublelayer for perpendicular magnetic recording media which was promoted as next generation recording media on slide glass substrate. The thickness of magnetic layer and Underlayer were varied from 20 to 100 nm and 5 to 100 m, respectively. The surface morphology and crystal structure of the CoCrTa/Si film were examined with XRD and AFM. Prepared thin films showed improvement of dispersion angle of c-axis orientation Δ$\theta$$\_$50/ caused by inserting amorphous Si underlayer.

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