Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2002.05a
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- Pages.56-56
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- 2002
Next Generation Scratch and Corrosion Free Conditioner for Chemical Mechanical Planarization
CMP 공정 중 polishing performance 향상을 위한 세라믹 컨디셔너의 개발과 특성평가
- Park, Jeom-Yong ;
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Park, Jin-Gu
;
- Koh, Sung (Hunatech Co.) ;
- Myoung, Beom-Yeong (Hunatech Co.) ;
- Kwon, Pan-Gi (Hynix Semiconductor Advanced Process-CMP) ;
- Lee, Sang-Ik (Hynix Semiconductor Advanced Process-CMP)
- Published : 2002.05.01
Abstract
Keywords