IBS법에 의한 BSCCO 박막의 에피택셜 성장

Epitaxial Growth of BSCCO Films by IBS Method

  • 양승호 (동신대학교 전기전자정보통신공학부) ;
  • 박용필 (동신대학교 전기전자정보통신공학부)
  • 발행 : 2002.05.01

초록

Bi$_2$Sr$_2$CuOx(Bi-2201) thin films were fabricated by atomic layer-by-layer deposition using an ion bean sputtering method. 10 wt% and 90 wt% ozone mired with oxygen were used with ultraviolet light irradiation to assist oxidation. XRD and RHEED investigations revealed that a buffer layer is formed at the early stage of deposition (less than 10 unit cell), and then c-axis oriented Bi-2201 grows on top of it.

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