한국정보디스플레이학회:학술대회논문집

한국정보디스플레이학회 (The Korean Infomation Display Society)
권호 표지

Microwave-Enhanced Low-Temperature Crystallization of Amorphous Silicon Films for TFTs

  • Ahn, Jin-Hyung (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
  • Eom, Ji-Hye (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
  • Ahn, Byung-Tae (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology)
  • 발행 : 2002.08.21
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

Microwave has been utilized for low-temperature crystallization of amorphous Si films. Microwave annealing lowered the crystallization temperature and shortened the annealing time. The combination of Ni and microwave applications on a-Si films further enhanced the crystallization. The enhancement was due to both reduced nucleation activation energy and growth activation energy.

키워드