Structural and discharge characteristics of MgO films prepared by Arc Ion Plating (AIP) method

  • Kim, Jong-Kuk (Advanced Thin Film Group, Korea Institute of Machinery and Materials (KIMM)) ;
  • Kim, Do-Geun (Advanced Thin Film Group, Korea Institute of Machinery and Materials (KIMM)) ;
  • Lee, Eun-Sung (Advanced Thin Film Group, Korea Institute of Machinery and Materials (KIMM)) ;
  • Lee, Sung-Hun (Advanced Thin Film Group, Korea Institute of Machinery and Materials (KIMM)) ;
  • Lee, Gun-Hwan (Advanced Thin Film Group, Korea Institute of Machinery and Materials (KIMM))
  • Published : 2002.08.21

Abstract

MgO thin films were deposited on glass and (100) Si substrates by an Arc Ion Plating (AIP) equipment using a magnesium metal target at various oxygen gas flow. In this work, we investigated the relationship between the structural properties and the discharge characteristics of MgO coating layers. X-ray diffraction and AFM have been used to study behaviors of the structure and surface morphology. The optical transmittance and the ion induced secondary electron emission coefficient of the MgO films have been also measured. The resistivity of the deposited MgO films was gradually increased from 0.17 G ohm/${\square}$ to 0.35 G ohm/${\square}$ with the oxygen gas flow. The growth rate of the MgO coating layer was decreased with increasing the oxygen gas flow, while the optical transmittance was improved.

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