Characteristics of linearly Extended Inductively Coupled Plasmas with Magnetic Fields

A large-area (830mm ${\times}$ 1,020mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. By employing the magnetic fields perpendicular to the six straight antenna currents using permanent magnets, improved plasma characteristics such as increase of the ion density and decrease of both electron temperature and plasma potential could be achieved in addition to the stability of the plasma possibly due to the reduction of the electron loss. However, the application of the magnetic field decreased the plasma uniformity slightly even though the uniformity within 10% could be maintained in the 800mm processing area.