반도전층/XLPE 의 불규칙한 유전 및 절연 특성

Anormal Dielectric and Insulation Properties of Semiconductor/XLPE

  • 이종찬 (원광대학교 전기전자 및 정보공학부) ;
  • 김광수 (원광대학교 전기전자 및 정보공학부) ;
  • 박대희 (원광대학교 전기전자 및 정보공학부)
  • 발행 : 2002.05.17

초록

Reduction of insulation thickness would be beneficial not only for increasing the cable length but would also improve its thermal performance. An interfacial diffusion method was devised to reduce insulation thickness by improving the interfacial properties of XLPE cable insulation. In this paper, to evaluate superficially the interface properties between XLPE insulation and semiconducting layer, the dielectric and insulation properties of tan${\delta}$ and volume resistance were measured with temperature dependence. Above the results, dielectirc and insulation properties with semiconductor/XLPE were more anormal than its bulk caused by the interfacial properties.

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