Dielectric Loss Tangent Measurement Using the $Al_{2}O_{3}$ Crystal Capacitor

$Al_{2}O_{3}$ Crystal Capacitor를 이용한 유전손실 측정

  • 김광수 (원광대학교 전기전자공학부) ;
  • 허인성 (원광대학교 전기전자공학부) ;
  • 이종찬 (원광대학교 전기전자공학부) ;
  • 박대희 (원광대학교 전기전자공학부)
  • Published : 2002.08.24

Abstract

The standard capacitor must have not only precise value of the capacitance but also the basic properties of low dielectric loss tangent. In the reforming process of capacitors, the dielectric loss tangent must be also reformed. In this paper, the development of standard capacitors of 10 and 100pF for the dielectric loss tangent standard using $Al_{2}O_{3}$ Crystal and the measurement of dielectric loss tangent are discussed. The dielectric loss tangent depends upon the surface between electrode and dielectric in capacitor. With using the Electric Field Simulator, precise design values of electrode are simulated. For the purpose of measuring capacitance effect just in the dielectric, 3-Terminal and 4-Terminal Pair configuration are applied respectively at the electrode and the connector for the measuring equipment. As stated above method, the standard capacitors of 10 and l00pF for the establishment of the dielectric loss tangent standard using the $Al_{2}O_{3}$ Crystal are made with low dielectric loss tangent less than 10-4.

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