Characteristics of the Polarization-Dependent Holographic grating formation on Ag/As-Ge-Se-S Multi-Layer

Ag/As-Ge-Se-S 다층박막에서 편광상태에 따른 홀로그래피 격장 형성 특성

  • 나선웅 (광운대학교 반도체 및 신소재공학과) ;
  • 이정태 (광운대학교 반도체 및 신소재공학과) ;
  • 여철호 (광운대학교 반도체 및 신소재공학과) ;
  • 이영종 (여주대학 전자공학과) ;
  • 정홍배 (광운대학교 반도체 및 신소재공학과)
  • Published : 2002.04.27

Abstract

We have carried out two-beam interference experiments to form holographic gratings on chalcogenide $Ag/As_{40}Se_{15}S_{35}Ge_{10}$ multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm) under different polarization combinations(intensity polarization holography, phase polarization holography). The diffraction efficiency was obtained by +1st order intensity and formed grating structure was investigated using atomic force microscopy.

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