Growth of $TiO_2$ thin films on Si(100) and Si(111) substrates using MOCVD and comparison of growth behavior and structural Properties

  • Jung, C.K. (Department of Chemistry and Institute of Basic Science, Sung kyun kwan University) ;
  • Lee, S.B. (Department of Chemistry and Institute of Basic Science, Sung kyun kwan University) ;
  • Boo, J.H. (Department of Chemistry and Institute of Basic Science, Sung kyun kwan University)
  • Published : 2002.02.19