Investigation of anti-wear additives for synthetic esters; Amine salts of phosphonic acid

  • Hasegawa, T. (Kochi University of Technology) ;
  • Minami, I. (Kochi University of Technology) ;
  • Kidera, Y. (NOF Corporation) ;
  • Hirao, K. (NOF Corporation) ;
  • Memita, M. (NOF Corporation)
  • 발행 : 2002.10.21

초록

Antiwear(AW) properties of phoshphonic acid derivatives for trimethylolpropane (TMP) esters were investigated under boundary conditions. AW effect of dialkyl phosphonates depends on polarity of base fluid. They provide good AW performance in less polar TMP esters, whereas their AW effect is not sufficient in polar TMP esters. Amine salts of phosphonic acid were developed as new AW additiνe system for TMP esters. They provide excellent AW performance even in polar TMP esters.

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