Measurement of Inductively Coupled Plasma Using Langmuir Probe

Langmuir Probe를 이용한 유도결합형 플라즈마의 측정

  • Lee, Y.H. (School of Electrical Electronic and Information Engineering, Wonkwang University) ;
  • Jo, J.U. (School of Electrical Electronic and Information Engineering, Wonkwang University) ;
  • Kim, K.S. (School of Electrical Electronic and Information Engineering, Wonkwang University) ;
  • Choi, Y.S. (School of Electrical Electronic and Information Engineering, Wonkwang University) ;
  • Park, D.H. (School of Electrical Electronic and Information Engineering, Wonkwang University)
  • 이영환 (원광대학교 전기 전자 및 정보 공학부) ;
  • 조주웅 (원광대학교 전기 전자 및 정보 공학부) ;
  • 김광수 (원광대학교 전기 전자 및 정보 공학부) ;
  • 최용성 (원광대학교 전기 전자 및 정보 공학부) ;
  • 박대희 (원광대학교 전기 전자 및 정보 공학부)
  • Published : 2003.07.21

Abstract

In this paper, electrical characteristics of inductively coupled plasma in an electrodeless fluorescent lamp were investigated using a Langmuir probe with a variation of Ar gas pressure. The RF output was applied in the range of 5-50W at 13.56MHz. The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of -100V ${\sim}$ +100V. When the pressure of Ar gas was increased, electric current was decreased. There was a significant electric current increase when the applied RF power was increased from 10 W to 30 W. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

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