Controlled oxidization process for ultra-thin aluminium films in high-performance magnetic tunnel junctions by using the microwave-excited plasma with radial line slot antenna

  • Tsunoda Masakiyo (Department of Electronic Engineering, Tohoku University) ;
  • Yoshimura Satoru (Department of Electronic Engineering, Tohoku University) ;
  • Takahashi Migaku (Department of Electronic Engineering, Tohoku University, New Industry creation Hatchery Center, Tohoku University)
  • Published : 2003.12.01